With a long history of development and supply lithography solutions, Obducat was the first company that commercialized Nano Imprint Lithography (NIL) and Electron Beam Recorder (EBR) and is now the most competitive supplier of NIL market.
Obducat products can be divided into two groups base on technical platforms, such as Nano Imprint Lithography (NIL) systems and Wet processing systems. This technical agility secures a high-performance system of equipment and processes suitable for industrial manufacturing and academia. The technology allows replication of extremely accurate structures at micro and nanoscale from a master onto a typically resistant covered surface or into a polymer film.
Constantly trying to find new solutions, Obducat is currently working on the development of integrated lithography systems where both wet processes and surface patterning by NIL are done within a fully integrated and closed system which will lead to an important advantage for several applications. This vision match one of the Obducat key strategic objectives that are to maintain a strong and broad patent based production for the development of new technologies, guaranteeing the costumers reliance.
For ARCIGS-M project, Obducat will develop a nanoimprint technology for the fabrication and replicate of light management structure and also do a thorough investigation of scalability of nanoimprint technology in CIGS manufacturing and its economic assessment. This partnership will make possible to offer new products to the market.
Babak Heidari, Chief Technical Officer and Rizgar Jiawook, Scientist and Senior Manager at Obducat will share their expertise on ARCIGS-M project.
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